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    Calculation of Orifice Diameter for Flow Restrictor (OF) in a Semiconductor Vertical Furnace System

    System Description: This PID diagram is used in a vertical furnace system for semiconductor production equipment. The gas used is high-purity N₂, with an inlet pressure below 1 MPa. The system is designed to control the N₂ flow rate to 10 L/min. How can the orifice diameter of the flow...

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