System Description:
This PID diagram is used in a vertical furnace system for semiconductor production equipment. The gas used is high-purity N₂, with an inlet pressure below 1 MPa. The system is designed to control the N₂ flow rate to 10 L/min. How can the orifice diameter of the flow restrictor (OF) be calculated?
This PID diagram is used in a vertical furnace system for semiconductor production equipment. The gas used is high-purity N₂, with an inlet pressure below 1 MPa. The system is designed to control the N₂ flow rate to 10 L/min. How can the orifice diameter of the flow restrictor (OF) be calculated?