prix27
Chemical
- Sep 26, 2012
- 8
I have got a Si wafer 4" in diameter. I am cleaning it using Piranha solution. I am spin coating water soluble PEDOTSS on top of it with static dispensing ( I am dispensing the material around 5ml before the spin starts). The material I deposit covers the substarte completely. I am spinning at the speed of 4000 rpm for 1min.
The issue is I am always getting comet tail defect or streak through out the wafer after spinning.
Before spin coating I am using syringe filter to filter out the particles from the solution. I am using a laurell 400 lte spin coater without a fragment adapter. I am just lying the wafer on chuck as the wafer is too big.
Please help. Your suggestions are highly appreciated. Please let me know IF I am doing anything wrong.
Best Regards
Prix
The issue is I am always getting comet tail defect or streak through out the wafer after spinning.
Before spin coating I am using syringe filter to filter out the particles from the solution. I am using a laurell 400 lte spin coater without a fragment adapter. I am just lying the wafer on chuck as the wafer is too big.
Please help. Your suggestions are highly appreciated. Please let me know IF I am doing anything wrong.
Best Regards
Prix