metrologic
Mechanical
- Sep 14, 2021
- 56
Sr GDTP Y14.5-2009 Exam Review Ch-4 Part-II Sep2021
Study review Part-II of III for Section 4, Datum Reference Frames. This thread covers subsections 4.12 thru 4.20.
Q1. 4.12.1 Simulation of a Single Datum Plane. Section 4.12 discusses multiple datum feature references, but I'm not concerned about that here. Fig 4-22 and Fig 4-23 illustrate some unopposed flat planes being used as primary datum features. These flat datum features are controlled with a simple profile tolerance. At least it seems simple. But if I'm not mistaken, this is the first instance where such primary datum features are being controlled by profile, instead of flatness. In these examples, does the flat datum feature simulator surface progress from an MMB toward an LMB? And since we are talking about moving a plane, what is the movement relative to? That is to say, does the datum feature simulator move relative to the location of the geometric tolerance zones in Fig 4-22 and Fig 4-23? Is the datum reference frame (DRF) established relative to the basic location of the datum feature simulator? Or does the DRF progress with the datum feature simulator. Please compare and contrast this with the example presented back in Fig 4-2, where simple planes controlled by flatness or perpendicularity establish the DRF.
Q2. 4.12.4 Pattern of Features of Size at RMB. "The datum feature simulators shall expand or contract simultaneously from their MMB to their LMB until the datum feature simulators make maximum possible contact with the extremities of the datum features(s). See Fig. 4-25." What does that mean? Are we simultaneously iteratively offsetting an equal distance for each simulator? Or are we scaling everything from a datum point or axis? I recall a lot of different adjectives being used to describe this process, but there never seems to be a precise definition developed. (And what does maximum contact mean, and does that always occur at minimum separation? Maybe it's covered in Y14.5.1M.)
Q3. 4.12.3 Pattern of Features of Size at MMB. "The origin of the datum reference frame may be established at the center of the pattern...or at any location defined with basic dimensions...." What about all those prior examples showing where to put the DRF in relation to this and that? Now we can just put it anywhere?
Q4. 4.12.4 Pattern of Features of Size at RMB. It seems like patterns referenced at RMB would suffer from instability frequently. I mean, it just takes one feature that is smaller or bigger than everything else in the pattern to prevent the datum feature simulator set from continuing its advance from MMB to LMB.
Q5. 4.14 Multiple Datum Reference Frames. "Where more than one datum reference frame is used and it is necessary to determine the relationships and calculate the boundaries between the reference frames, the relationship between the reference frames shall be specified." I guess I kinda understand what is being discussed here, but this could really use an illustrative example. I've never seem something like this before.
Q6. 4.16.6 Offset Planar Datum Feature Set at Basic Constraining a Rotational Degree of Freedom. Look at Fig 4-31. The figure has three parts (a), (b), and (c). On the left side they show a "This on the drawing" and on the right side they show a "Means this". In Fig 4-31 (a), the offset secondary planar datum feature B is referenced RMB. And the "Means this" illustration says "No translation or rotation of datum feature is allowed" -with a leader pointing to datum feature B. In Fig 4-31 (b), the offset secondary planar datum feature B is referenced as B[BSC]. And the "Means this" illustration says "No translation or rotation of datum feature is allowed" -with a leader again pointing to datum feature B. In Fig 4-31 (c), the offset secondary planar datum feature B is referenced MMB. And the "Means this" illustration says "Datum feature B must remain in contact at a minimum of one point". Why is the "Means this" description different for datum feature B referenced at [BSC] versus MMB? Is there a subtle difference between B[BSC] and B modified with MMB that I am not seeing?
Q7. 4.16.7 Offset Planar Datum Feature Set at MMB Constraining a Rotational Degree of Freedom. As mentioned earlier, in Fig 4-31 (c), the offset secondary planar datum feature B is referenced MMB. And the "Means this" illustration says "Datum feature B must remain in contact at a minimum of one point". It also states in this subsection: "Where the datum feature simulator and the higher precedence datum axis do not limit rotation in both directions about the datum axis, the datum feature must always contact the datum feature simulator." And back in 4.11.9 it said, "The datum feature shift/displacement shall always be limited or constrained by the datum feature simulator. If the datum feature simulator geometry is such that it does not fully limit or constrain the feature...beyond the established boundary limits...then the feature must remain in contact with the datum feature simulator, and datum shift or displacement is not allowed." Is one point of contact enough in all cases? Or does it depend on the circumstances such as order of precedence and degrees of freedom under consideration, etc.? I mean, if only one point of contact were necessary, wouldn't that allow for some significant additional freedom of movement in many scenarios? That sounds like datum shift. How exactly is datum shift disallowed for non-compliant datum feature simulator combinations?
Q8. 4.17 Application of MMB, LMB, and RMB to Irregular Features of Size. Back in subsection 2.7 I read: "Unless otherwise specified, the limits of size of a feature prescribe the extent within which variations of geometric form, as well as size, are allowed. This control applies solely to individual regular features of size...." Now here we are in subsection 4.17 and I read: "MMB, LMB, and RMB may be applied to irregular features of size when they are selected as datum features." If irregular features of size can have RMB, MMB, and LMB modifiers applied when used as datum features, why can't they have perfect form boundaries at MMC like regular features of size? Why were irregular features of size excluded from subsection 2.7's form control dictum?
Q9. Fig 4-35. This figure shows four different ways three pins could function as irregular features of size for datum features. How would these examples typically be toleranced? Are the pins themselves toleranced? Or would there be a tolerance associated with the irregular diameter or width?
Q10. 4.20 Restrained Condition. "In a restrained application, it is permissible to use as many datum targets as necessary to establish the datum features." It's not permissible to use as many as we want for free-state applications????
Study review Part-II of III for Section 4, Datum Reference Frames. This thread covers subsections 4.12 thru 4.20.
Q1. 4.12.1 Simulation of a Single Datum Plane. Section 4.12 discusses multiple datum feature references, but I'm not concerned about that here. Fig 4-22 and Fig 4-23 illustrate some unopposed flat planes being used as primary datum features. These flat datum features are controlled with a simple profile tolerance. At least it seems simple. But if I'm not mistaken, this is the first instance where such primary datum features are being controlled by profile, instead of flatness. In these examples, does the flat datum feature simulator surface progress from an MMB toward an LMB? And since we are talking about moving a plane, what is the movement relative to? That is to say, does the datum feature simulator move relative to the location of the geometric tolerance zones in Fig 4-22 and Fig 4-23? Is the datum reference frame (DRF) established relative to the basic location of the datum feature simulator? Or does the DRF progress with the datum feature simulator. Please compare and contrast this with the example presented back in Fig 4-2, where simple planes controlled by flatness or perpendicularity establish the DRF.
Q2. 4.12.4 Pattern of Features of Size at RMB. "The datum feature simulators shall expand or contract simultaneously from their MMB to their LMB until the datum feature simulators make maximum possible contact with the extremities of the datum features(s). See Fig. 4-25." What does that mean? Are we simultaneously iteratively offsetting an equal distance for each simulator? Or are we scaling everything from a datum point or axis? I recall a lot of different adjectives being used to describe this process, but there never seems to be a precise definition developed. (And what does maximum contact mean, and does that always occur at minimum separation? Maybe it's covered in Y14.5.1M.)
Q3. 4.12.3 Pattern of Features of Size at MMB. "The origin of the datum reference frame may be established at the center of the pattern...or at any location defined with basic dimensions...." What about all those prior examples showing where to put the DRF in relation to this and that? Now we can just put it anywhere?
Q4. 4.12.4 Pattern of Features of Size at RMB. It seems like patterns referenced at RMB would suffer from instability frequently. I mean, it just takes one feature that is smaller or bigger than everything else in the pattern to prevent the datum feature simulator set from continuing its advance from MMB to LMB.
Q5. 4.14 Multiple Datum Reference Frames. "Where more than one datum reference frame is used and it is necessary to determine the relationships and calculate the boundaries between the reference frames, the relationship between the reference frames shall be specified." I guess I kinda understand what is being discussed here, but this could really use an illustrative example. I've never seem something like this before.
Q6. 4.16.6 Offset Planar Datum Feature Set at Basic Constraining a Rotational Degree of Freedom. Look at Fig 4-31. The figure has three parts (a), (b), and (c). On the left side they show a "This on the drawing" and on the right side they show a "Means this". In Fig 4-31 (a), the offset secondary planar datum feature B is referenced RMB. And the "Means this" illustration says "No translation or rotation of datum feature is allowed" -with a leader pointing to datum feature B. In Fig 4-31 (b), the offset secondary planar datum feature B is referenced as B[BSC]. And the "Means this" illustration says "No translation or rotation of datum feature is allowed" -with a leader again pointing to datum feature B. In Fig 4-31 (c), the offset secondary planar datum feature B is referenced MMB. And the "Means this" illustration says "Datum feature B must remain in contact at a minimum of one point". Why is the "Means this" description different for datum feature B referenced at [BSC] versus MMB? Is there a subtle difference between B[BSC] and B modified with MMB that I am not seeing?
Q7. 4.16.7 Offset Planar Datum Feature Set at MMB Constraining a Rotational Degree of Freedom. As mentioned earlier, in Fig 4-31 (c), the offset secondary planar datum feature B is referenced MMB. And the "Means this" illustration says "Datum feature B must remain in contact at a minimum of one point". It also states in this subsection: "Where the datum feature simulator and the higher precedence datum axis do not limit rotation in both directions about the datum axis, the datum feature must always contact the datum feature simulator." And back in 4.11.9 it said, "The datum feature shift/displacement shall always be limited or constrained by the datum feature simulator. If the datum feature simulator geometry is such that it does not fully limit or constrain the feature...beyond the established boundary limits...then the feature must remain in contact with the datum feature simulator, and datum shift or displacement is not allowed." Is one point of contact enough in all cases? Or does it depend on the circumstances such as order of precedence and degrees of freedom under consideration, etc.? I mean, if only one point of contact were necessary, wouldn't that allow for some significant additional freedom of movement in many scenarios? That sounds like datum shift. How exactly is datum shift disallowed for non-compliant datum feature simulator combinations?
Q8. 4.17 Application of MMB, LMB, and RMB to Irregular Features of Size. Back in subsection 2.7 I read: "Unless otherwise specified, the limits of size of a feature prescribe the extent within which variations of geometric form, as well as size, are allowed. This control applies solely to individual regular features of size...." Now here we are in subsection 4.17 and I read: "MMB, LMB, and RMB may be applied to irregular features of size when they are selected as datum features." If irregular features of size can have RMB, MMB, and LMB modifiers applied when used as datum features, why can't they have perfect form boundaries at MMC like regular features of size? Why were irregular features of size excluded from subsection 2.7's form control dictum?
Q9. Fig 4-35. This figure shows four different ways three pins could function as irregular features of size for datum features. How would these examples typically be toleranced? Are the pins themselves toleranced? Or would there be a tolerance associated with the irregular diameter or width?
Q10. 4.20 Restrained Condition. "In a restrained application, it is permissible to use as many datum targets as necessary to establish the datum features." It's not permissible to use as many as we want for free-state applications????